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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vol. 410Pulsed Laser Deposition of Thin-Film Coatings in...

Pulsed Laser Deposition of Thin-Film Coatings in an Electrostatic Field

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Abstract:

The work is devoted to the problem of thin metal coatings deposition on dielectric substrates using the method of target material pulsed laser evaporation. The main advantage of laser ablation over other methods of coating deposition is the possibility of using practically any material as a target, while the resulting films are characterized by a high correspondence of the phase and chemical composition to the target material. The possibility of using an electrostatic field to improve the efficiency of coating deposition process is considered. Under the action of an electric field formed between the plates of high-voltage electrodes, the ablation products leave the treatment area and settle on the substrate surface. Examples of coatings deposited under various ablation conditions are shown.

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Materials Engineering and Technologies for Production and Processing VII

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Periodical:

Defect and Diffusion Forum (Volume 410)

Pages:

753-757

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.410.753

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Online since:

August 2021

Authors:

Ruslan V. Chkalov*, Darya G. Chkalova

Keywords:

Electrostatic Field, Femtosecond Laser, Material Ablation, Pulsed Laser Deposition, Thin-Film Coatings

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© 2021 Trans Tech Publications Ltd. All Rights Reserved

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