Low-Temperature Diffusion of Hydrogen and the Roles of Defects in Silicon

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Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Edited by:

M. Koiwa, K. Hirano, H. Nakajima and T. Okada

Pages:

1001-1006

DOI:

10.4028/www.scientific.net/DDF.95-98.1001

Citation:

Y. Kamiura et al., "Low-Temperature Diffusion of Hydrogen and the Roles of Defects in Silicon", Defect and Diffusion Forum, Vols. 95-98, pp. 1001-1006, 1993

Online since:

January 1993

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$35.00

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