Oxidation Behavior of Silicides

Abstract:

The oxidation behavior of Mo, Nb, and Ti-silicides has received significant attention in past few decades for their potential to be used as high temperature structural materials. These Si-bearing intermetallic alloys have the ability to form an oxide scale containing SiO₂, which is protective if formed as a continuous and impervious layer, so that the ingress of oxygen from atmosphere to the underneath alloy is restricted. To form a continuous and stable SiO₂ scale, it is important to have sufficient activity of Si along with thermodynamic and kinetic conditions favoring its growth in comparison to that of oxides of other alloying elements. MoSi₂ has superior oxidation resistance compared to that of Mo₃Si or Mo₅Si₃, because of its higher Si content. Furthermore, a continuous film of SiO₂ is able to form at temperatures in the range of 800-1700 ^oC on MoSi₂ due to vaporization of MoO₃, but not on NbSi₂ or TiSi₂ due to competitive growth of Nb₂O₅ or TiO₂, respectively. During past two decades, a significant effort has been devoted to development of Mo-Si-B alloys containing Mo-rich solid solution, Mo₃Si and Mo₅SiB₂ as constituent phases, due to their ability to form a protective borosilicate scale. The presence of B₂O₃ contributes to fluidity of borosilicate scale, thereby contributing to closure of porosities. Efforts have been also made to develop multicomponent Nb-silicide based alloys with optimum combination of mechanical properties and high temperature oxidation resistance with limited success. There have been efforts to develop silicide based coatings for protection oxidation for Mo-rich Mo-Si-B alloys and Nb-Si based ternary or multicomponent alloys with inadequate oxidation resistance. Oxidation behavior of selected silicides with potential for structural application, along with mechanisms for protection against oxidation has been reviewed and discussed.

• Periodical: Diffusion Foundations (Volume 21)
• Pages: 127-156
• DOI: https://doi.org/10.4028/www.scientific.net/DF.21.127
• Online since: March 2019
• Authors: Rahul Mitra
• Keywords: Kinetics, Molybdenum Silicides, Niobium Silicides, Oxidation, Oxide Scale Growth, Pesting, Thermodynamic Stability, Titanium Silicides

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