Paper Titles

Reactive Magnetron Sputtering of Indium Tin Oxide on Acrylics
p.507

Investigation of the Wetting Characteristics of Chromium Based Active Braze Alloys on Silicon Nitride
p.511

The Direct Bonding of Metals to Ceramics for the Manufactured Microwave Packages
p.515

Nanocrystalline Coating by Electrophoretic Deposition (EPD)
p.519

Effect of Tantalum Addition on Optical Transmittance and Electrical Resistivity of TiN Thin Films Prepared by d.c. Magnetron Sputtering
p.523

Modelling of the Growth of Carbide Layers in Tantalum
p.527

Structural Characterization of Amorphous Carbon Nitride Thin Films Prepared by Pulsed Laser Deposition
p.531

Oxygen Influence on Wetting and Bonding between Copper and Aluminum Nitride
p.535

Formation of TiO₂-SiO₂ Composite Thin Films and their Crystallization Behaviors
p.539

HomeKey Engineering MaterialsKey Engineering Materials Vols. 206-213Effect of Tantalum Addition on Optical...

Effect of Tantalum Addition on Optical Transmittance and Electrical Resistivity of TiN Thin Films Prepared by d.c. Magnetron Sputtering

Article Preview

Abstract:

You might also be interested in these eBooks

Euro Ceramics VII

Info:

Periodical:

Key Engineering Materials (Volumes 206-213)

Pages:

523-526

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.206-213.523

Citation:

Cite this paper

Online since:

December 2001

Authors:

O. Bourbia, S. Achour, S. Zerkout, M. Benkahoul, Abdelhamid Harabi

Keywords:

DC Magnetron Sputtering, Electrical Resistivity, Reflectance, Tantalum Addition, Titanium Nitride, Transmittance

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 2002 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: