Effect of Tantalum Addition on Optical Transmittance and Electrical Resistivity of TiN Thin Films Prepared by d.c. Magnetron Sputtering

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Periodical:

Key Engineering Materials (Volumes 206-213)

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Edited by:

C. Kermel, V. Lardot, D. Libert and I. Urbain

Pages:

523-526

Citation:

O. Bourbia et al., "Effect of Tantalum Addition on Optical Transmittance and Electrical Resistivity of TiN Thin Films Prepared by d.c. Magnetron Sputtering", Key Engineering Materials, Vols. 206-213, pp. 523-526, 2002

Online since:

December 2001

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