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HomeKey Engineering MaterialsKey Engineering Materials Vols. 214-215Effect of Ti Source on Preparation of Pb-Based...

Effect of Ti Source on Preparation of Pb-Based Oxide Thin Films Using LSCVD

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Asian Ceramic Science for Electronics I

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Periodical:

Key Engineering Materials (Volumes 214-215)

Pages:

129-132

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.214-215.129

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Online since:

July 2001

Authors:

Masashi Higuchi, Man Young Park, Naoki Wakiya, Kazuo Shinozaki, Nobuyasu Mizutani

Keywords:

Liquid Source, LSCVD, Metalorganic Precursor, PbTiO₃, Thin Film

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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