Growth Model of Gas Species Produced by the Hot-Wire and Hot-Wire Plasma-Assisted Techniques

Rodrigo Martins; Isabel Ferreira; Elvira Fortunato

doi:10.4028/www.scientific.net/KEM.230-232.603

Paper Titles

Role of the i-Layer Thickness in the Performance of a-Si:H Schottky Barrier Photodiodes
p.587

Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique
p.591

Processing and Characterization of Ba-Based Layered Ferroelectric Relaxors
p.595

Structural Characterisation of Zinc Oxide Thin Films Produced by Spray Pyrolysis
p.599

Growth Model of Gas Species Produced by the Hot-Wire and Hot-Wire Plasma-Assisted Techniques
p.603

Study of PbTe Epitaxial Layers Grown Directly Over Silicon Wafers
p.607

Hard Nanocomposite Coatings Prepared by Magnetron Sputtering
p.613

Nanometer-Scale Multilayered Mo/Ti_0.4Al_0.6N Hard Coatings
p.623

Structural and Thermal Behaviour of a W-Ti-N Sputtered Film after Thermal Annealing
p.627

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Growth Model of Gas Species Produced by the Hot-Wire and Hot-Wire Plasma-Assisted Techniques

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Periodical:

Key Engineering Materials (Volumes 230-232)

Pages:

603-606

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.230-232.603

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Online since:

October 2002

Authors:

Rodrigo Martins, Isabel Ferreira, Elvira Fortunato

Keywords:

Growth Mechanism, Optoelectronic Materials, Silicon Thin Films

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References

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