Surface Characterization of Electrochemically Fabricated CuO Doped ZnO Thin Film

Abstract:

In this study, ZnO and CuO doped zinc oxide thin films were cathodically deposited in aqueous zinc chloride solutions in the presence of oxygen on a Pt/Ti/SiO2/Si substrate through an electrochemical reaction. A mercurous sulfate electrode was used as a reference electrode and the counter electrode was a Pt spiral wire. Deposition was carried out in solutions containing Zn2+ ions introduced as ZnCl2 salt at concentrations ranging from 5.0 x 10-4 to 5.0 x 10-2 M. The bath temperatures were controlled from 65°C to 80°C. The oxygen gas was introduced from argon/oxygen mixtures allowing its partial pressure to be fixed along with its concentration in the solution. Doping of CuO was carried out in cupric nitrate or a cupric chloride/0.1M KCl solution. The influence of the Cu/Zn concentration, deposition temperature of a solution, applied cathodic potential and deposition time were optimized. After the potential was applied, the cathodic current reached a steady state within 5 min. The composition, and the characterization of the surface of the films were investigated through X-ray diffractometry, X-ray photoelectron spectroscopy, atomic force microscopy and scanning electron microscopy.

• Periodical: Key Engineering Materials (Volumes 277-279)
• Pages: 972-976
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.277-279.972
• Online since: January 2005
• Authors: Jang Hee Yoon, Yoon Bo Shim, Chae Ryong Cho, Mi Sook Won
• Keywords: Atomic Force Microscope (AFM), CuO Doped ZnO Thin FIlm, Scanning Electron Microscope (SEM), X-Ray Photoelectron Spectroscopy (XPS)

References

[1] T.R.N. Kutty, N. Raghu: Appl. Phys. Lett. Vol. 54 (1989), p.1796.

[2] S. T. Jun, G.M. Choi: J. Am. Ceram. Soc. Vol. 81 (1998), p.695.

[3] J.V. Bellini, M.R. Morelli, R.H.G.A. Kiminami: J. Mater. Sci. Mater. Electron. Vol. 13 (2002), p.485.

[4] Z. H. Gu and T. Z. Fahidy: J. Electrochem. Soc. Vol. 146 (1999), p.156.

[5] G. E. F. Brewwer: nCeram. Bull. Vol. 51 (1972), p.216.

[6] J. A. Switzer, Am. Chram. Bull. Vol. 66 (1987), p.1521.

[7] S. Peulon and D. Lincot: J. Electrochem. Soc. Vol. 145 (2000), p.3345.

[8] M. Izaki and T. Omi: Appl. Phys. Lett. Vol. 68 (1996), p.2439.