Verification of Prediction Method for Electromigration Failure Using Angled Polycrystalline Line

Abstract:

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Electromigration is one of the main damage mechanisms of interconnecting metal lines. Recently, a governing parameter for electromigration damage in passivated polycrystalline lines, AFD* gen, was formulated, and a prediction method for electromigration failure in passivated polycrystalline line was developed using AFD* gen. This method requires only the film characteristics of the metal line and the application is not limited by a line shape and operating condition. The usefulness of the method has been shown using the straight-shaped lines. Using the ymmetrically and asymmetrically angled lines experiments are performed, and the line-shape dependency of the lifetime obtained by the prediction method is verified comparing with the results obtained from the experiment.

Info:

Periodical:

Key Engineering Materials (Volumes 297-300)

Edited by:

Young-Jin Kim, Dong-Ho Bae and Yun-Jae Kim

Pages:

263-268

DOI:

10.4028/www.scientific.net/KEM.297-300.263

Citation:

S. Uno et al., "Verification of Prediction Method for Electromigration Failure Using Angled Polycrystalline Line ", Key Engineering Materials, Vols. 297-300, pp. 263-268, 2005

Online since:

November 2005

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Price:

$35.00

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