Fabrication and Microstructural Change of PMN-PT Thin Films on Si Substrates by PLD with Mask and Double-Pulse Lazer Excitation

Shogo  Hayashi; Naoki Wakiya; Takanori Kiguchi; M. Tanaka; Kazuo Shinozaki

doi:10.4028/www.scientific.net/KEM.350.111

Paper Titles

Phase Transition Temperatures of Divalent and Trivalent Ions Substituted (Bi_1/2Na_1/2)TiO₃ Ceramics
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Crystal Phase and Orientation Dependence of Electro-Optic Effect in Epitaxial PLZT an PZT Films
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Structure and Electric Property of BaTi₂O₅ Film by Laser Ablation
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Improvement of Orientation and Characterization of Dielectric Property for (Y,Yb)MnO₃/HfO₂/Si Structures
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Fabrication and Microstructural Change of PMN-PT Thin Films on Si Substrates by PLD with Mask and Double-Pulse Lazer Excitation
p.111

Preparation of Bi₄Ti₃O₁₂ Based Thick Films by Screen Printing
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Figure of Merit for Thermoelectric Generation Obtained by Enhanced Transport Properties of [100] Oriented Beta-FeSi₂ Film
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Fabrication and Application of MoSi₂-Thin-Film Electric Heaters
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Fabrication of HfO₂ Thin Film on Si Substrate by Double-Pulse Excitation PLD
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 350Fabrication and Microstructural Change of PMN-PT...

Fabrication and Microstructural Change of PMN-PT Thin Films on Si Substrates by PLD with Mask and Double-Pulse Lazer Excitation

Abstract:

Epitaxial Pb(Mg1/3Nb2/3)O3-PbTiO3 (PMN-PT) thin films were fabricated on (La,Sr)CoO3/CeO2/ YSZ coated Si substrates by double-pulse excitation PLD with and without a mask. For double-pulse excitation PLD without a mask in conditions of Nd:YAG laser irradiation before defocused KrF-excimer-laser irradiation, the surface roughness of PMN-PT thin films was rather less than that of the films fabricated using Nd:YAG single laser PLD. Thin films with smoother surfaces were deposited at the high deposition rate of 5.6 nm·min-1 using the mask and the double-pulse excitation PLD method in conditions of irradiation of Nd:YAG laser after KrF excimer laser at 0.5 =s delays.

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Periodical:

Key Engineering Materials (Volume 350)

Pages:

111-114

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.350.111

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Online since:

October 2007

Authors:

Shogo Hayashi, Naoki Wakiya, Takanori Kiguchi, M. Tanaka, Kazuo Shinozaki

Keywords:

Double-Pulse Laser Excitation, Droplet, Mask, PLD, PMN-PT, Thin Film

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References

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[1] [2] [3] [4] [5] [0] [10] [20] [30] [40] [50] [60] [70] [80] -1. 5 -1 -0. 5 0 0. 5 1 1. 5 deposition rate / nm min-1 rms roughness / nm delaytime / µs Nd: YAG laser without mask Nd: YAG laser with mask.

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