Fabrication and Microstructural Change of PMN-PT Thin Films on Si Substrates by PLD with Mask and Double-Pulse Lazer Excitation

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Epitaxial Pb(Mg1/3Nb2/3)O3-PbTiO3 (PMN-PT) thin films were fabricated on (La,Sr)CoO3/CeO2/ YSZ coated Si substrates by double-pulse excitation PLD with and without a mask. For double-pulse excitation PLD without a mask in conditions of Nd:YAG laser irradiation before defocused KrF-excimer-laser irradiation, the surface roughness of PMN-PT thin films was rather less than that of the films fabricated using Nd:YAG single laser PLD. Thin films with smoother surfaces were deposited at the high deposition rate of 5.6 nm·min-1 using the mask and the double-pulse excitation PLD method in conditions of irradiation of Nd:YAG laser after KrF excimer laser at 0.5 =s delays.

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Periodical:

Edited by:

K. Katayama, K. Kato, T. Takenaka, M. Takata and K. Shinozaki

Pages:

111-114

Citation:

S. Hayashi et al., "Fabrication and Microstructural Change of PMN-PT Thin Films on Si Substrates by PLD with Mask and Double-Pulse Lazer Excitation ", Key Engineering Materials, Vol. 350, pp. 111-114, 2007

Online since:

October 2007

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$38.00

[1] N. Nemoto et al., Key Engineering Materials, v 301, Electroceramics in Japan VIII, p.265 (2006).

[2] K. Shinozaki et al., Jpn. J. Appl. Phys., submitted.

[3] D. N. Stratis et al., Appl. Spectrosc., 54, 1270 (2000).

[4] Laser Ablation and Applications, Corona Publishing. Co. Ltd, p.105(1999).

[1] [2] [3] [4] [5] [0] [10] [20] [30] [40] [50] [60] [70] [80] -1. 5 -1 -0. 5 0 0. 5 1 1. 5 deposition rate / nm min-1 rms roughness / nm delaytime / µs Nd: YAG laser without mask Nd: YAG laser with mask.

DOI: https://doi.org/10.5772/36448

[1] [2] [3] [4] [5] [6] [0] [10] [20] [30] [40] [50] [60] [70] [80] [10] 15 20 25 30 35 40 Deposition rate / nm min-1 RMS roughness / nm Mask-substrate distance / mm Thick mask Thin mask · Thick mask Thin mask.