Fabrication and Microstructural Change of PMN-PT Thin Films on Si Substrates by PLD with Mask and Double-Pulse Lazer Excitation
Epitaxial Pb(Mg1/3Nb2/3)O3-PbTiO3 (PMN-PT) thin films were fabricated on (La,Sr)CoO3/CeO2/ YSZ coated Si substrates by double-pulse excitation PLD with and without a mask. For double-pulse excitation PLD without a mask in conditions of Nd:YAG laser irradiation before defocused KrF-excimer-laser irradiation, the surface roughness of PMN-PT thin films was rather less than that of the films fabricated using Nd:YAG single laser PLD. Thin films with smoother surfaces were deposited at the high deposition rate of 5.6 nm·min-1 using the mask and the double-pulse excitation PLD method in conditions of irradiation of Nd:YAG laser after KrF excimer laser at 0.5 =s delays.
K. Katayama, K. Kato, T. Takenaka, M. Takata and K. Shinozaki
S. Hayashi et al., "Fabrication and Microstructural Change of PMN-PT Thin Films on Si Substrates by PLD with Mask and Double-Pulse Lazer Excitation ", Key Engineering Materials, Vol. 350, pp. 111-114, 2007