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Preparation of Bi₄Ti₃O₁₂ Based Thick Films by Screen Printing
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Figure of Merit for Thermoelectric Generation Obtained by Enhanced Transport Properties of [100] Oriented Beta-FeSi₂ Film
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Fabrication and Application of MoSi₂-Thin-Film Electric Heaters
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Fabrication of HfO₂ Thin Film on Si Substrate by Double-Pulse Excitation PLD
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Morphology Control of Zirconia Thin Films Prepared Using Photochromic Precursors
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Electrochemical Properties of Lithium Titanate Synthesized by Reassembly of Nanosheets
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CO₂ Absorption Properties of Barium Orthotitanate under Continuous Operation
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 350Fabrication and Application of MoSi2-Thin-Film...

Fabrication and Application of MoSi₂-Thin-Film Electric Heaters

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Electroceramics in Japan X

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Periodical:

Key Engineering Materials (Volume 350)

Pages:

125-128

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.350.125

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Online since:

October 2007

Authors:

Yuki Itoh, Masashi Satoh, Shinzo Yoshikado

Keywords:

Alumina Substrate, High Temperature Heater, Mo₃Si Thin-Film, Operation in High Vacuum, RF Magnetron Sputtering

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Сopyright:

© 2007 Trans Tech Publications Ltd. All Rights Reserved

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Citation:

[1] K. Nakagawa, T. Tamamizu, and N. Umeda, "Fine ceramics", Giken (1982), p.100

[2] S. Hayashi and S. Yoshikado, Key Eng. Mater., 216 (2002), p.105

[3] K. Wakisaka, Y. Ito, H. Kado, and S. Yoshikado, T.IEE Japan, 126-A, (2006), p.135