Simulation of Light Scattering from Nanostructured Surfaces

Abstract:

This paper presents an efficient computation method to evaluate scattered light intensity distributions, generated by a nanostructured surface which is illuminated with a monochromatic laser beam of several millimeters in diameter. The new simulation approach based on a modified Huygens-Fresnel approximation enables to improve measuring methods without expensive and time consuming experiments. The qualitative verification of the model results in a roughness measuring principle based on double scattering of coherent light.

• Periodical: Key Engineering Materials (Volumes 381-382)
• Pages: 27-30
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.381-382.27
• Online since: June 2008
• Authors: Andreas Tausendfreund, S. Patzelt, S. Simon, G. Goch
• Keywords: Far-Field Simulation, In-Process Metrology, Light Scattering, Micro Metrology, Nano Metrology, Nanostructure

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