Simulation of Gas Flow Field in HFCVD System for CVD Diamond Growth

Huan Qing Lin; Wen Zhuang Lu; Dun Wen Zuo; Chun Yang; Feng Xu

doi:10.4028/www.scientific.net/KEM.431-432.21

Paper Titles

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Study on Mixed Assembly Modeling of Rigid and Flexible Parts for Aerospace Product Virtual Assembly
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Numerical Simulation of the Prestressed Laser Welding of 7075－T7451 Aluminum Alloy Sheet
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Preparation and Evaluation of Hydrophilic Fixed Abrasive Pad
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Simulation of Gas Flow Field in HFCVD System for CVD Diamond Growth
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Experimental Research on Cutting of Silicon with Fixed Diamond Wire Saw
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Fatigue Life Simulation on Forestay Bar of Aircraft Landing Gear
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Effect of Anisotropy on Chemical Mechanical Polishing of LBO Crystal
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Research on High-Speed Preparation of Micro-Nanocrystalline Diamond Film
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HomeKey Engineering MaterialsKey Engineering Materials Vols. 431-432Simulation of Gas Flow Field in HFCVD System for...

Simulation of Gas Flow Field in HFCVD System for CVD Diamond Growth

Abstract:

The thermal blockage and thermal round flow in HFCVD system for CVD diamond growth will lead to un-stability of product quality. Finite element method has been used to simulate the gas flow field around the cutting tool substrate within a HFCVD diamond reactor. Experiments have been done to prove the simulation results. Excellent agreement between simulation and experiment was obtained by depositing of CVD diamond coated cutting tool. The thermal blockage and thermal round flow in HFCVD system decrease by using a hollow substrate holder. High quality CVD diamond coating can be obtained using a hollow substrate holder.