For Libraries For Publication Open Access Downloads About Us Contact Us
Paper Titles
Deposition Kinetics of the Cristobalite Aluminum Phosphate Coating on SiC Coated Carbon/Carbon Composites Prepared by Hydrothermal Electrophoretic Technique
p.492
Fabrication of Superhydrophobic Surfaces of Titanium Dioxide and Nickel through Electrochemical Deposition on Stainless Steel Substrate
p.496
Characterization of Silicon Carbide Grown on RB-SiC by Chemical Vapor Deposition
p.499
Preparation of Hydroxyapatite/Chitosan Biological Coatings on Carbon/Carbon Composites
p.502
Influence of Annealing Temperatures on the Properties of Dual-Layer W-TiO2 Thin Films
p.506
Characteristic of Palladium Coated Tubular Alumina Composite Membrane for Hydrogen Separation
p.510
A Study of Different Sintering Routes on Properties of Ni-Al2O3 Hydrogen Separation Membrane
p.514
Preparation and Characterization of Different Composition Mg-Cu Tapes
p.518
Preparation of Electroless Ni-Mo Coated TiC Powder
p.522

Influence of Annealing Temperatures on the Properties of Dual-Layer W-TiO2 Thin Films

Article Preview

Abstract:

W-TiO2 (W, tungsten) dual-layer thin films are deposited by RF magnetron sputtering onto glass substrates and annealed at 150oC~400oC for 4hrs. The crystal structure, morphology, and trans- mittance of annealed W-TiO2 dual-layer thin films are investigated by X-ray diffraction, FESEM, and UV-Vis spectrometer, respectively. The annealing temperatures have large effect on the properties of W-TiO2 dual-layer thin films. The band gap energy values of W-TiO2 dual-layer thin films are evaluated from (h)1/2 versus energy plots. The energy gap for un-annealed W-TiO2 dual-layer thin film is 3.16 eV. As the annealing temperature increases from 150oC to 400oC, the energy gap decreases from 3.16 eV to 3.10 eV.

You might also be interested in these eBooks
High-Performance Ceramics VI View Preview

Info:

Periodical:

Key Engineering Materials (Volumes 434-435)

Pages:

506-509

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.434-435.506

Citation:

Cite this paper

Online since:

March 2010

Authors:

Chia Cheng Huang, Fang Hsing Wang, Cheng Fu Yang, Hong Hsin Huang, Cheng Yi Chen, Ping Chih Huang

Keywords:

Dual-Layer Thin Films, Energy Gap, RF Sputtering, TiO2, Tungsten

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 2010 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

References

[1] W. Zhang, Y. Li, S. Zhu, F. Wang: Surf. Coat. Technol. Vol. 182 (2004), p.192.

Google Scholar

[2] R. Wang, K. Hashimoto, A. Fujishima, et al.: Nature Vol. 388 (1997), p.431.

Google Scholar

[3] T. Watanabe, A. Nakajima, R. Wang, et al.: Thin Solid Films Vol. 351 (1999), p.260.

Google Scholar

[4] N.N. Lichtin, M. Avudathai, E. Berman, et al.: Sol. Energy Vol. 56 (1996), p.377.

Google Scholar

[5] T.M. Wang, H.Y. Wang, and P. Xu: Thin Solid Films Vol. 334 (1998), p.103.

Google Scholar

[6] M.A. San Miguel, C.J. Calzado, J.F. Sanz: Surf. Sci. Vol. 409 (1998), p.92.

Google Scholar

[7] T. Miyagi, M. Kamei, T. Ogawa, et al.: Thin Solid Films Vol. 442 (2003), p.32.

Google Scholar

[8] R.A. Spurr and H. Myers: Anal. Chem. Vol. 29 (1957), p.769.

Google Scholar

[9] T. Hashimoto, T. Yoko, S. Sakka: Bull. Chem. Soc. Jpn. Vol. 67 (1994), p.653.

Google Scholar

[10] M. Sreemany and S. Sen: Mater. Chem. Phys. Vol. 83 (2004), p.169.

Google Scholar

[11] H. Tang, K. Prasad, R. Sanjines, et al.: J. Appl. Phys. Vol. 75 (1994).

Google Scholar

© 2025 Trans Tech Publications Ltd. All rights are reserved, including those for text and data mining, AI training, and similar technologies. For open access content, terms of the Creative Commons licensing CC-BY are applied.
Scientific.Net is a registered trademark of Trans Tech Publications Ltd.