Microrelief Measurements for White-Light Interferometer with Adaptive Algorithm Interferogram Processing

Evgeny V. Sysoev; Rodion V. Kulikov

doi:10.4028/www.scientific.net/KEM.437.35

Paper Titles

Topical Tasks of Metrology due to Measuring Instruments Computerization
p.13

Multivariant System of Perspectives
p.18

Coherent Optical Method for Studies of Nanoscale Objects in Liquid Media Based upon Spatial Averaging of Data
p.25

Measurement and Visualization of Dynamics of Piezoelectric Microcantilever
p.30

Microrelief Measurements for White-Light Interferometer with Adaptive Algorithm Interferogram Processing
p.35

Model-Based Correction of Image Distortion in Scanning Electron Microscopy
p.40

Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure
p.45

Nanorelief Measurements Errors for a White-Light Interferometer with Chromatic Aberrations
p.51

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern
p.56

HomeKey Engineering MaterialsKey Engineering Materials Vol. 437Microrelief Measurements for White-Light...

Microrelief Measurements for White-Light Interferometer with Adaptive Algorithm Interferogram Processing

Abstract:

The problem of reducing measurement errors of surface microrelief with nonuniform scattering properties using white-light interferometer was discussed. Adaptive algorithm of thresholding which allows us to set optimal threshold in every point of measuring surface was proposed. Application of this algorithm of threshold choice allows increasing dynamical range of interference detection more than in 10 times. The dependences of scanning interferometer resolution on differentional interferogram thresholding have been discussed.

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Periodical:

Key Engineering Materials (Volume 437)

Pages:

35-39

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.437.35

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Online since:

May 2010

Authors:

Evgeny V. Sysoev, Rodion V. Kulikov

Keywords:

Interference, Relief Measurement, Surface Quality Inspection, Thresholding

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References

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