Nanorelief Measurements Errors for a White-Light Interferometer with Chromatic Aberrations

Evgeny V. Sysoev

doi:10.4028/www.scientific.net/KEM.437.51

Paper Titles

Measurement and Visualization of Dynamics of Piezoelectric Microcantilever
p.30

Microrelief Measurements for White-Light Interferometer with Adaptive Algorithm Interferogram Processing
p.35

Model-Based Correction of Image Distortion in Scanning Electron Microscopy
p.40

Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure
p.45

Nanorelief Measurements Errors for a White-Light Interferometer with Chromatic Aberrations
p.51

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern
p.56

Design and Analysis of a 6-DOF Monolithic Nanopositioning Stage
p.61

In Situ Mechanical Property Measurement of Titania Nanowires
p.66

Computed Tomography for Application in Manufacturing Metrology
p.73

HomeKey Engineering MaterialsKey Engineering Materials Vol. 437Nanorelief Measurements Errors for a White-Light...

Nanorelief Measurements Errors for a White-Light Interferometer with Chromatic Aberrations

Abstract:

Chromatic aberrations in white-light interferometer can dramatically increase measurement nanorelief errors. It is shown that these errors can be more than 70 nm. They are result of changing effective wavelength within the measurement field. We have proposed the method for error calculation using measurement data and then their correction experimentally up to 10 nm.

You might also be interested in these eBooks

Measurement Technology and Intelligent Instruments IX

View Preview

Info:

Periodical:

Key Engineering Materials (Volume 437)

Pages:

51-55

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.437.51

Citation:

Cite this paper

Online since:

May 2010

Authors:

Evgeny V. Sysoev

Keywords:

Interference, Interferometer, Nanometer, Resolution, White-Light

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] P. de Groot, J. Biegen, J. Clack, X.C. de Lega, and D. Grigg: Optical interferometry for measurement of the geometric dimensions of industrial parts. Appl. Opt., 19 (2002), pp.3853-3860.

DOI: 10.1364/ao.41.003853

Google Scholar

[2] M. Davidson, K. Kaufman, and I. Mazor: The coherence probe microscope. Solid State Technol., 30 (1987), pp.57-59.

Google Scholar

[3] P.J. Caber, S.J. Martinek, R.J. Niemann: A new interferometric profiler for smooth and rough surface. Laser Dimensional Metrology Recent Advances for Industrial Application. M.J. Downs, ed. Proc. SPIE, Vol. 2088 (1993), pp.195-203.

DOI: 10.1117/12.168073

Google Scholar

[4] David J. Aziz: Interferometric measurement of surface roughness in engine cylinder walls. Opt. Eng., 37 (1998), pp.1429-1434.

DOI: 10.1117/1.601703

Google Scholar

[5] P. de Groot, X.C. de Lega, J. Kramer, and M. Turzhitsky: Determination of fringe order in white-light interference microscopy. Appl. Opt., 22 (2002), pp.4571-4578.

DOI: 10.1364/ao.41.004571

Google Scholar

[6] M. Fleischer, R. Windecker and H.J. Tiziani: Fast algorithms for data reduction in modern optical three-dimensional profile measurement system with MMX technology. App. Opt., 8 (2000), pp.1290-1297.

DOI: 10.1364/ao.39.001290

Google Scholar

[7] G.S. Kino and S.S.C. Chim: Mirau correlation microscope. Appl. Opt., 29 (1990), pp.3775-3738.

DOI: 10.1364/ao.29.003775

Google Scholar

[8] E.V. Sysoev: Partial Scanning of Correlogramms for Measurement of Surface Microreliefs. Optoelectronic, Instrumentation and Data Processing, Vol. 43, No. 1 (2007).

Google Scholar

[9] M. Fleischer, R. Windecker, and H.J. Tiziani: Theoretical limits of scanning white-light interferometry signal evalution algorithms. Appl. Opt., 17 (2001), pp.2815-2820.

DOI: 10.1364/ao.40.002815

Google Scholar

[10] Jan Niehues, Peter Lehmann: Dual-wavelength vertical scanning low-coherence interference microscopy. Proc. SPIE, Vol. 6616 (2007).

DOI: 10.1117/12.726108

Google Scholar