Design and Analysis of a 6-DOF Monolithic Nanopositioning Stage

Ling Li Cheng; Jian Wei  Yu; Xiao Fen Yu

doi:10.4028/www.scientific.net/KEM.437.61

Paper Titles

Model-Based Correction of Image Distortion in Scanning Electron Microscopy
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Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure
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Nanorelief Measurements Errors for a White-Light Interferometer with Chromatic Aberrations
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Fabrication of Large Grating by Monitoring the Latent Fringe Pattern
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Design and Analysis of a 6-DOF Monolithic Nanopositioning Stage
p.61

In Situ Mechanical Property Measurement of Titania Nanowires
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Computed Tomography for Application in Manufacturing Metrology
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Achieving Traceability of Industrial Computed Tomography
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Developments in Homodyne Interferometry
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 437Design and Analysis of a 6-DOF Monolithic...

Design and Analysis of a 6-DOF Monolithic Nanopositioning Stage

Abstract:

A 6-DOF monolithic nanopositioning stage is developed for three coordinate measuring machines (CMM) with nanometer resolution. The stage consists of a monolithic flexure hinge mechanism, six piezoelectric actuators and six fiber-optic displacement sensors. A mathematical model of the constraint optimization problem is presented. Based on the solution of the optimization problem, the final design of the 6-DOF stage is also presented. The numerical analysis on static and dynamic behavior of the stage is done by using the finite element method. The experimental results of the performance of the 6-DOF stage are presented.

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Periodical:

Key Engineering Materials (Volume 437)

Pages:

61-65

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.437.61

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Online since:

May 2010

Authors:

Ling Li Cheng, Jian Wei Yu, Xiao Fen Yu

Keywords:

6-DOF, Flexure Hinge, Nanopositioning, Piezoelectric Actuator

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