Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure

Zhuang De Jiang; Feng Xia Zhao; Wei Xuan Jing; Philip D. Prewett; Kyle Jiang

doi:10.4028/www.scientific.net/KEM.437.45

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 437Motif Parameters Based Characterization of Line...

Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure

Abstract:

Motif parameters were introduced to characterize line edge roughness (LER) of a nanoscale grating structure. Firstly with electron beam lithography employed the expected nano-scale grating structure with linewidth of 16 nm was fabricated on positive resist. Then the line edge profiles of the structure were extracted and their LERs were characterized. The results showed that the evaluation method is rather simple, effective and recommendable.

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Periodical:

Key Engineering Materials (Volume 437)

Pages:

45-50

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.437.45

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Online since:

May 2010

Authors:

Zhuang De Jiang, Feng Xia Zhao, Wei Xuan Jing, Philip D. Prewett, Kyle Jiang

Keywords:

Line Edge Roughness, Motif Parameter, Nanoroughness, Nanostructure

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References

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