Model-Based Correction of Image Distortion in Scanning Electron Microscopy

Dominic Gnieser; Carl Georg Frase; Harald Bosse; Rainer Tutsch

doi:10.4028/www.scientific.net/KEM.437.40

Paper Titles

Multivariant System of Perspectives
p.18

Coherent Optical Method for Studies of Nanoscale Objects in Liquid Media Based upon Spatial Averaging of Data
p.25

Measurement and Visualization of Dynamics of Piezoelectric Microcantilever
p.30

Microrelief Measurements for White-Light Interferometer with Adaptive Algorithm Interferogram Processing
p.35

Model-Based Correction of Image Distortion in Scanning Electron Microscopy
p.40

Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure
p.45

Nanorelief Measurements Errors for a White-Light Interferometer with Chromatic Aberrations
p.51

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern
p.56

Design and Analysis of a 6-DOF Monolithic Nanopositioning Stage
p.61

HomeKey Engineering MaterialsKey Engineering Materials Vol. 437Model-Based Correction of Image Distortion in...

Model-Based Correction of Image Distortion in Scanning Electron Microscopy

Abstract:

A new Monte-Carlo program for simulation image formation in scanning electron microscopy for real three-dimensional use is presented; factors of image distortions are realized in the program, in respect of future photogrammetric evaluation. A first attempt for generating a 3D-analysis of simulated images is shown.

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Periodical:

Key Engineering Materials (Volume 437)

Pages:

40-44

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.437.40

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Online since:

May 2010

Authors:

Dominic Gnieser, Carl Georg Frase, Harald Bosse, Rainer Tutsch

Keywords:

Micro-Metrology, Monte-Carlo Simulation, Nano-Metrology, Scanning Electron Microscope (SEM)

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