Determination of Thickness of PZO Films Deposited on ITO Glass Substrates

Xue Jiao Li; Cheng Zhang; Na Zhang

doi:10.4028/www.scientific.net/KEM.537.161

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 537Determination of Thickness of PZO Films Deposited...

Determination of Thickness of PZOFilms Deposited on ITO Glass Substrates

Abstract:

PZO (PbZrO₃) coatings with different thicknesses were deposited onto Indium Tin Oxide ITO glass substrates at room temperature by magnetron sputtering technique. UV-Vis absorption spectra method and microhardness testing method were used to measure the thickness of coating. It was proved that the measuring results of film thickness by two kinds of methods were equivalent, and either one method can be alternatively used to determine the thickness of deposited films.

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Key Engineering Materials (Volume 537)

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161-164

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.537.161

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January 2013

Authors:

Xue Jiao Li, Cheng Zhang, Na Zhang

Keywords:

Film Thickness, Microhardness, PbZrO₃, UV-VIS

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References

[1] F. Mitsugi, A. Matsuoka, Y. Umeda, Development of thickness measurement program for transparent conducting oxide, Thin Solid Films. 518 (2010) 6330–6333.

DOI: 10.1016/j.tsf.2010.03.047

Google Scholar

[2] J. Pei, F.L. Degertekin, B.V. Honein, B.T. Khuri-Yakub, K.C. Saraswa, In-situ thin film thickness measurement using ultrasonics waves, Proc. Int. Ultrasonic Symp. (1994) 1237–1240.

DOI: 10.1109/ultsym.1994.401809

Google Scholar

[3] J. Lhotka, R. Kuzel, G. Cappuccio, V. Valvod, Thickness determination of thin polycrystalline film by grazing incidence X-ray diffraction, Surf. Coat. Technol. 148 (2001) 96–101.

DOI: 10.1016/s0257-8972(01)01327-5

Google Scholar

[4] K.H. Chen, C.C. Hsu, D.C. Su, Appl. Phys. B 77 (2003) 839.

Google Scholar

[5] G. Cox, C.J.R. Sheppard, et al. Measurement of thin coatings in the confocal microscope, Micron 32 (2001) 701–705.

DOI: 10.1016/s0968-4328(01)00017-8

Google Scholar