Thin Film Materials for Optical Interference Filters

A. Kosyachkov; L. Wang; J. Anzellotti; R. Hallock; C. Hodgson

doi:10.4028/www.scientific.net/KEM.538.345

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Thin Film Materials for Optical Interference Filters
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 538Thin Film Materials for Optical Interference...

Thin Film Materials for Optical Interference Filters

Abstract:

Abstract. Microstructural, optical and mechanical properties of oxide and fluoride films are examined. Superior optical quality, durability and environmental stability are achieved for oxides deposited by ion assist reactive ion beam sputtering and thermal evaporation. The materials and deposition techniques are discussed with regards to manufacturing of optical interference filters for near-UV – mid-IR wavelengths. High performance of thin film materials and optical filters is demonstrated.

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Periodical:

Key Engineering Materials (Volume 538)

Pages:

345-348

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.538.345

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Online since:

January 2013

Authors:

A. Kosyachkov, L. Wang, J. Anzellotti, R. Hallock, C. Hodgson

Keywords:

Coating, Ion Beam Sputtering, Optical Interference Filters, Optical Materials, Thin Film

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References

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