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Direct Surface Relief Formation in Polymer Films

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Abstract:

Due to active development of nanoelectronics, the studies of methods of nanorelief surface formation in different materials, in particular polymers are very important. Organic polymer films in consequence of their dielectric and optical properties have been used as basis of these devices. In this paper, the possibility of UV optical record and electron beam lithography in different type of polymeric films was studied. Mechanisms of molecular structure changes: photoisomerization, destruction, cross-linking and oxidation have been discussed. The results of UV illumination of polyurethanes, polyacrylates, and some block-copolymers were described. The element analysis of polybutadiene block copolymer was performed before and after UV illumination, and the changes in optical transmission spectra of the polymer film were measured. The resolution of electron beam lithography on polymeric films also was studied.

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Periodical:

Key Engineering Materials (Volume 543)

Pages:

281-284

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.543.281

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Online since:

March 2013

Authors:

Andrejs Gerbreders, Vadims Kolobjonoks, Oksana Shimane, Janis Teteris

Keywords:

Electron Beam Lithography, Polymer, Surface Relief

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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References

[1] Ozols A et al. Thin Solid Films 516, (2008) 8887–8892.

Google Scholar

[2] Gerbreders A at al. Proc. of SPIE 7142, (2008) 714212-2.

Google Scholar

[3] Yang K at al. Phys. Rev. B 73, (2006) 165204.

Google Scholar

[4] Nikolava L, Ramanujam P Polarization holography., Cambridge University Press, (2009) 239p.

Google Scholar

[5] Bityurin N 2005 Annu. Rep. Prog. Chem., Sect. C. 101, 216–247.

Google Scholar

[6] Bounos G at al. 2006 J. Appl. Phys. 100, 114323.

Google Scholar

[7] Yang C-R et al. 2004 J. Micromech. Microeng. 14 1126–1134.

Google Scholar

[8] Rubahn K at al. 2004 Appl. Phys. A 79 1715–1719.

Google Scholar

[9] Shaw J at al. 1997 IBM J. Res. Develop. Vol. 41 No. 1/2 81-94.

Google Scholar

[10] Gerbreders A at al. submitted to IOP Conference Series: Materials Science and Engineering. (2012).

Google Scholar

[11] Vesely D. Ultramicroscopy. 14, (1984) 279-290.

Google Scholar

[12] Hayashi S. at al. Japan. J. of Appl. Phys. 23, No. 11, Nov. (1984) 1488 – 1491.

Google Scholar

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