Effect of Ar Pressure on Properties of Polycrystalline CdZnTe Films

Bei Ling Yao; Jian Huang; Liang Min Cai; Ke Tang; Bing Ren; Jie Zhou; Jun Le; Li Ya Shen; Yue Zhu; Lin Jun Wang

doi:10.4028/www.scientific.net/KEM.544.226

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 544Effect of Ar Pressure on Properties of...

Effect of Ar Pressure on Properties of Polycrystalline CdZnTe Films

Abstract:

Polycrystalline CdZnTe (CZT) films were grown by close-spaced sublimation method. The CdZnTe films were prepared on fluorine doped tin oxide (FTO) glass substrates at various argon (Ar) pressures from 200 Pa to 700 Pa. A comparative study of the films at different pressures was obtained by X-ray diffraction (XRD), scanning electron microscope (SEM) and Energy dispersive spectrometer (EDS) respectively. The XRD studies revealed that CdZnTe films had a preferential orientation along the (111) phase except the one at 500 pa. EDS analysis indicated that the increasing of Ar pressure decreased Zn content.

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Periodical:

Key Engineering Materials (Volume 544)

Pages:

226-229

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.544.226

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Online since:

March 2013

Authors:

Bei Ling Yao, Jian Huang, Liang Min Cai, Ke Tang, Bing Ren, Jie Zhou, Jun Le, Li Ya Shen, Yue Zhu, Lin Jun Wang

Keywords:

Ar Pressure, CdZnTe Film, Close-Spaced Sublimation

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