Three-Dimensional Analysis of Divergence Aangle on Deposition of Chromium Atoms in Laser Standing Wave Field

Jing Huang; Bao Hu Zhu; Wen Tao Zhang

doi:10.4028/www.scientific.net/KEM.562-565.1033

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 562-565Three-Dimensional Analysis of Divergence Aangle on...

Three-Dimensional Analysis of Divergence Aangle on Deposition of Chromium Atoms in Laser Standing Wave Field

Abstract:

Three-dimensional analysis of the effects of atom beam divergence angle on the process of fabricating nanograting is discussed based on the three-dimensional motion model of Cr atoms in Gaussian standing wave laser field. From the simulative results it can be seen that Atomic beam spreading plays an important role in determining the deposition nanometer quality, so the preparation of a high-collimated and transversely cooled atomic beam, typically under 0.6mrad, is essential to minimize the severely disadvantageous effects for deposition of atoms in laser standing wave

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Periodical:

Key Engineering Materials (Volumes 562-565)

Pages:

1033-1036

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.562-565.1033

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Online since:

July 2013

Authors:

Jing Huang, Bao Hu Zhu, Wen Tao Zhang

Keywords:

Atom Lithography, Divergence Angle, Laser Standing Wave

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