Chromium Atomic Deposits under the Disturbance of Straight Edge Diffraction

Bao Hu Zhu; Jing Huang; Wen Tao Zhang

doi:10.4028/www.scientific.net/KEM.562-565.74

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 562-565Chromium Atomic Deposits under the Disturbance of...

Chromium Atomic Deposits under the Disturbance of Straight Edge Diffraction

Abstract:

The ideal Gaussian standing wave field model and the Gaussian standing wave field model under the condition of straight edge diffraction disturbance were established, and computer simulation and numerical analysis were done to the two kinds of models. It is concluded that the center position of Chromium atomic sedimentary grating in the straight edge diffraction disturbance standing wave will be away from the diffraction edge; near the given ideal deposit position, the PTVH(Peak to Valley Height) of Chromium atomic sedimentary grating in the ideal standing wave is higher than that in the straight edge diffraction disturbance standing wave, and the FWHM(Full Width at Half Maximum) is also narrower than in the ideal standing wave; for the exist of straight edge diffraction the size of the acceptable sedimentary pattern will be smaller, which has theoretical guidance on the practical operation.

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Periodical:

Key Engineering Materials (Volumes 562-565)

Pages:

74-78

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.562-565.74

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Online since:

July 2013

Authors:

Bao Hu Zhu, Jing Huang, Wen Tao Zhang

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Full Width Half Maximum (FWHM), Gaussian Standing Wave, PTVH, Straight Edge Diffraction

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References

[1] J J McClelland, R E Scholten, E C Palm, Laser-focused atomic deposition, Science 262(1993) 877-880.

DOI: 10.1126/science.262.5135.877

Google Scholar

[2] Zhang Wentao, Zhu Baohua, Huang Jing, Xiong Xianming, Jiang Qubo, Influence of divergence angle on deposition of neutral chromium atoms using laser standing wave, Chinese Physics B 32(2012) 033301-1-5.

DOI: 10.1088/1674-1056/21/3/033301

Google Scholar

[3] Zhang Wentao, Zhu Baohua, Xiong Xianming, Analysis of nanometer structure for chromium atoms in gauss standing laser wave, Chinese Physics Letters 27(2010) 12302-1-4.

DOI: 10.1088/0256-307x/27/12/123202

Google Scholar

[4] Zhang Baowu, Zhang Wentao, Ma Yang, Li Tongbao, Collimation of chromium beam by one-dimensional doppler laser with large collimating slit, Acta Phys. Sin. 57(2008) 5485-5490.

DOI: 10.7498/aps.57.5485

Google Scholar

[5] Zhang Baowu, Li Tongbao, Ma Yan, One-dimensional doppler laser collimation of chromium beam with a novel pre-collimating scheme, Chinese Optics Letters 6(2008) 782-784.

DOI: 10.3788/col20080610.0782

Google Scholar

[6] M.Mutzel, U.Rasbach, D.Meschede, Atomic nanofabrication with complex light fields, Appl. Phys. B, 77(2003) 1-9.

Google Scholar

[7] Zhang Wentao, Zhu Baohua, Huang Jing, Xiong Xianming, Chromium atom deposition in elliptical standing wave filed, Acta Phys. Sin. 60(2011) 103203-1-5

DOI: 10.7498/aps.60.103203

Google Scholar