Influence of Substrate Temperature and Bias Voltage on Structure and Mechanical Properties of CrN Coatings

Abstract:

CrN coatings have been deposited successfully by Closed Filed Unbalanced Magnetron Sputter Ion Plating (CFUMSIP). The effect of substrate temperature (T_S) and bias voltage (V_B) together on microstructure, morphologies and mechanical properties of CrN coatings were studied. The results showed that the deposition rate of CrN coatings declines with the increase of V_B Under both room temperature (R.M.) and 300°C. The FCC-CrN disappeared gradually and orth-CrN arised with the increase of V_B, and the T_S promoted the transformation from FCC - CrN to orth - CrN. The surface morphology of CrN coatings with changed V_Bs was greatly different, and V_B could further improve the mechanical properties of coatings. In this paper, the CrN coating with the parameters (T_S =300°C, V_B =-30V) had relatively high deposition rate and mechanical properties.

• Periodical: Key Engineering Materials (Volume 591)
• Pages: 99-103
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.591.99
• Online since: November 2013
• Authors: Hao Zhang, Shu Wang Duo, Xiang Min Xu, Huan Ke, Ting Zhi Liu, Xiao Yan Fei, Zi Hao Zhou
• Keywords: Bias Voltage, CFUMSIP, CrN Coatings, Substrate Temperature

References

[1] S. Luca, G. F. Maria, L. Beatriz. Properties and performances of innovative coated tools for turning inconel, Machine Tools &Manufacture. 48(2008)815-823.

DOI: 10.1016/j.ijmachtools.2007.12.007

[2] J.L. Mo, M.H. Zhu. Tribological characterization of chromium nitride coating deposited by filtered cathodic vacuum arc, Applied Surface Science. 255(2009)7627-7634.

DOI: 10.1016/j.apsusc.2009.04.040

[3] X.S. Wan, Y.Y. Shi, J. Ma, et al. Salt spray corrosion behaviour of CrN coatings deposited by arc ion plating, Acta Metallurgica Sinica. 46(2010)600-606.

DOI: 10.3724/sp.j.1037.2009.00759

[4] R. Cecchini, A. Fabrizi, M. Cabibbo, et al. Mechanical, microstructural and oxidation properties of reactively sputtered thin Cr-N coatings on steel, Thin Solid Films. 519(2011)6515-6521.

DOI: 10.1016/j.tsf.2011.04.115

[5] M.D. Huang, G.Q. Lin, C. Dong, et al. Mechanism of effect of bias on morphologies of films prepared by arc ion plating, ACTA METALLURGICA SINICA. 39(2003)510-515.

[6] V.N. Zhitomirsky, I. Grimberg, L. Rapoport, et al. Bias Voltage and incidence angle effects on the structure and properties of Vacuum arc deposited TiN coatings, Surface and Coatings Technology. 133-134(2000)114-120.

DOI: 10.1016/s0257-8972(00)00884-7

[7] H. Nakajima, T. Tanaka, M. Hashimoto, et al. Growth structure and magnetic property of CoPt films on GaAs (001) by d. c. - sputter deposition, Thin Solid Films. 459(2004)156-159.

DOI: 10.1016/j.tsf.2003.12.121

[8] J.J. Li, W.T. Zheng, Z.S. Jin, et al. Influence of substrate dc bias on chemical bonding, adhesion and roughness of carbon nitride films, Applied Surface Science. 191(2002)273-279.

DOI: 10.1016/s0169-4332(02)00221-0

[9] L. Yu, J.W. Liu, J. Zhao, et al. Effect of substrate temperature on the properties of ion plating TiN films, Acta Metallurgica Sinica. 32 (1996) 1270-1274.

[10] X. Liu, Z.M. Yu, D.F. Yin, et al. Effect of N2 flow rate and substrate temperature on (Ti, Al) N films deposited by reactive sputtering, Mining and Metallurgical Engineering. 24(2004)80-82.

[11] Q. Miao, C. Cui, J.D. Pan, et al. Effect of temperature on the TiN film deposited on AZ91D magnesium alloy by arc-glow depositing technique, Rare Metal Materials and Engineering. 36(2007)2036-(2040).