Paper Titles

Preparation and Properties of B₄C/Graphite Neutron Absorption Ball
p.248

Large Scale Al₂O₃-ZrO₂ (Y₂O₃) Eutectic and Hypereutectic Achieved by Combustion Synthesis in High Gravity Field
p.252

Preparation of Anti-Static Ceramics by Fe-Infiltration on Sintered Zirconia Body
p.258

Preparation of High Strength and Lightweight Wall Materials Using Oil Shale Ash as Raw Materials
p.262

Optimal Preparation and Characterization of Sputtered Y₂O₃ Films on Sapphire Substrates
p.266

Si/SiC-Based Layer Deposited on Boron Carbide Particles via CVD
p.270

Wetting Behaviors of Nickel-Based Alloys on Sintered Silicon Carbide Ceramics
p.274

Effect of Heat-Treatment in Ar Atmosphere on Pore Structure of Carbonaceous Materials from Polysiloxane
p.279

Study of Al/SiC Package Substrate for High Power LED
p.285

HomeKey Engineering MaterialsKey Engineering Materials Vols. 602-603Optimal Preparation and Characterization of...

Optimal Preparation and Characterization of Sputtered Y₂O₃ Films on Sapphire Substrates

Article Preview

Abstract:

Normal 0 7.8 磅 0 2 false false false MicrosoftInternetExplorer4 It is necessary to prepare compressive films on sapphire window for preventing its high-temperature failure. In this study, the yttrium oxide (Y₂O₃) thin films were deposited on the sapphire substrates by RF reactive magnetron sputtering with varying sputtering pressure. The as-deposited Y₂O₃films were also annealed. The composition, structure, refractive index and mechanical properties of the films were systematically analyzed by XPS, XRD, ellipsometry and nanoindention method, respectively. The influences of sputtering pressure on the deposition velocity and the refractive index were investigated. It can obtain desirable Y₂O₃ thin films for the preparation conditions (sputtering pressure: 10Pa, substrate temperature: 500°C, RF power: 200W) after annealing in O₂ at 500°C for 1h. The refractive index and hardness both have the maximum value (1.8337 and 3.98 GPa), respectively. The elastic module has the minimum value (109.24 GPa). It is promising for the Y₂O₃ film as the underlayer of protective coating of sapphire windows.