Chronoamperometry Study of the Electrodeposited Ni_100-XP_x Alloy Thin Films

Abstract:

Elecrodeposited Ni-P alloy thin films have been the subject of extended investigations, since the pioneering works of Brenner et al, in the late 1940s. It is well known, that the physical and chemical properties of the Ni-P deposit composition are strongly influenced by the preparation conditions. In our experimental procedure, we have used a Parstat 2253 potensiostat equipped with Power-Suite software. All the electrochemical experiments were performed in a three electrode cell in which the volume of the bath was 150ml, in this experimental technique, we can measure one or more of three parameters: the potential (V), current (i), and time (t). The aim of our work consists to study the nucleation and growth process and given morphology and composition of electrodeposited Ni_x-P_100-x thin films on Copper substrates. For this purpose, cyclic voltametry and chnonoamperomaty have been used in order to determine the previous cited properties of thin films Ni-P, [0.10 of NaPH₂O₂ solutions. The chrnoamperogramms can be interpreted by the use of one of three models called: Growth mode (Me layer by layer formation); Franck Van der Merwe, FM model, Growth mode 3D (Me island formation on the top of predeposited), 2D Meads overlayers on substrat and Stranski-Krastanov; (SK model).

• Periodical: Key Engineering Materials (Volume 605)
• Pages: 661-664
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.605.661
• Online since: April 2014
• Authors: Hadria Medouer*, Chahira Benyekken, Saci Messaadi
• Keywords: Alloy Thin Films, Chronoamperometry, Growth Process, Nickel-Phosphorous, Nucleation Process

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