Characterization of Sputter-Deposited NiTi Thin Film by Nanoindentation

Petr Haušild; Michal Landa

doi:10.4028/www.scientific.net/KEM.662.87

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 662Characterization of Sputter-Deposited NiTi Thin...

Characterization of Sputter-Deposited NiTi Thin Film by Nanoindentation

Abstract:

NiTi shape memory alloy thin film sputter-deposited on a large scale silicon wafer was characterized by means of instrumented (depth-sensing) indentation technique. Thickness of deposited thin film was measured by calotest device. Microstructure of thin film was observed using differential interference (Nomarski) contrast. It was shown that the local mechanical properties are different in areas containing different phases (austenite and martensite) according to different deposition conditions (kinetic energy of deposited atoms when impacting the substrate surface).

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Periodical:

Key Engineering Materials (Volume 662)

Pages:

87-90

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.662.87

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Online since:

September 2015

Authors:

Petr Haušild*, Michal Landa

Keywords:

Instrumented Indentation, NiTi, Shape Memory Effect

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References

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