Distribution Status of Trace Oxygen in Fe3Si-Si3N4

Mei Gao; Yong Li; Hai Xia Qin; Bin Li; Jia Lin Sun; Jun Hong Chen; Wen Dong Xue

doi:10.4028/www.scientific.net/KEM.680.107

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 680Distribution Status of Trace Oxygen in Fe3Si-Si3N4

Distribution Status of Trace Oxygen in Fe₃Si-Si₃N₄

Abstract:

The distribution status of trace oxygen in the ferro-silicon nitride (Fe₃Si-Si₃N₄) was investigated at the present, which was prepared by flash combustion synthesis method from FeSi75. The results showed that while the grain size of FeSi75 used in preparing Fe₃Si-Si₃N₄ was less than0.074 mm, “active oxidation” occurred firstly, silicon was oxidized to form gaseous SiO(g), oxygen partial pressure was reduced in the system, silicon reacted with nitrogen directly to form Si₃N₄ while the system oxygen partial pressure approached less than 10^-19MPa (T=1823K). O₂(g) promoted the formation of Si₃N₄, Gaseous SiO(g) finally reacted with nitrogen and Si to form Si₂N₂O. The ferro silicon nitride was characterized by X-ray diffractometer and scanning electron microscope, the distribution of Si₂N₂O was uneven in the silicon nitride, and Si₂N₂O mainly distributed around Fe₃Si or near the hole.

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Periodical:

Key Engineering Materials (Volume 680)

Pages:

107-110

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.680.107

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Online since:

February 2016

Authors:

Mei Gao*, Yong Li, Hai Xia Qin, Bin Li, Jia Lin Sun, Jun Hong Chen, Wen Dong Xue

Keywords:

Flash Combustion Synthesis, Gaseous Silicon Monoxide, Silicon Nitride, Silicon Oxynitride

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