The Effects of the Carrier Concentrations on the Hall Mobilities of ZnO:Al Thin Films Deposited by Magnetron Sputtering

Article Preview

Abstract:

ZnO:Al thin films were deposited on flexible substrates by magnetron sputtering. The effects of the carrier concentrations on the hall mobilities of AZO films were investigated. When the carrier concentration was high (~1020/cm3), the hall mobility decreased with increase of the carrier concentration, showing obvious characteristics of ionized impurity scattering; moreover, the carrier mobility could be expressed to be-2.14/3 proportional of the carrier concentration by combining the results of simulation and experiments.simulation and experiment. When the carrier concentration was about a magnitude of 1019 cm-3, the carrier mobility is influenced by the carrier concentration and grain size, which means the carrier mobility was affected by both the grain boundary scattering and ionized purity scattering mechanism.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

938-941

Citation:

Online since:

January 2017

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2017 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

* - Corresponding Author

[1] S. PYong, S.S. Moon ,S.K. Jin and J.Y. Lee : Mater Res Bull Vol. 48(2013), p.5136.

Google Scholar

[2] K.H. Ri , Y.B. Wang , W.L. Zhou , J.X. Gao , X.J. Wang and J. Yu : Appl Surf Sci Vol. 257(2011), p.5471.

Google Scholar

[3] S. Fernandez , J.D. Santos , C. Munuera , M. Garcia-Hernandez and F.B. Naranjo : Sol Energy Mater Sol Cells Vol. 133(2015), p.170.

Google Scholar

[4] T. Dimopoulos, M. Bauch, R.A. Wibowo, N. Bansal, R. Hamid, M. Auer, M. Jäger and E.J.W. List-Kratochvil: Mater Sci Eng B Vol. 200( 2015), p.84.

DOI: 10.1016/j.mseb.2015.06.008

Google Scholar

[5] W.T. Yen , Y.C. Lin and J.H. Ke: Appl Surf Sci Vol. 257(2010), p.960.

Google Scholar

[6] M. Berginski, J. Hupkes, W. Reetz, B. Rech and M. Wuttig: Thin Solid Films Vol. 516 (2008), p.5836.

DOI: 10.1016/j.tsf.2007.10.029

Google Scholar

[7] Y.H. wang,H.M. Kim , Y.H. Um and H.Y. Park: Mater Res Bull Vol. 47( 2012), p.2487.

Google Scholar

[8] D.K. Kim and H.B. Kim: Superlattice Microst Vol. 85( 2015), p.50.

Google Scholar

[9] C.S. Hao, M.M. Shirolkar ,J.N. Li, B.J. Wu, S.L. Yin,M. Li and H.Q. Wang: Appl Surf Sci Vol. 351 ( 2015), p.392.

Google Scholar

[10] K. Ellmer and R. Mientus: thin Solid Films Vol. 516( 2008), p.5829.

Google Scholar

[11] T. Minami, H. Sato, K. Ohashi, T. Tomofuji and Takata S: J Crystal Growth Vol. 117( 1992), p.370.

Google Scholar

[12] X.J. Wang, Q.S. Lei, W. Xu,W.L. Zhou and J. Y: Mater Lett Vol. 63( 2009), p.1371.

Google Scholar

[13] T. Schuler and M.A. Aegerter: Thin Solid Films Vol. 351( 1999), p.125.

Google Scholar

[14] P.A. Wolff : Phys Rev Vol. 126( 1962), p.405.

Google Scholar