Wettability and Durability of Si-O Coatings on Zirconia Substrate by RF-Magnetron Plasma Sputtering

Abstract:

The wettability and durability of Si-O coatings prepared on zirconia substrate using radiofrequency magnetron sputtering (rf-sputtering) was studied. XRD analysis revealed no phase transformation of zirconia before/after rf-sputtering process. XPS spectroscopy showed that as-deposited films with a SiO₂ configuration was formed. EDX analysis indicated that the Si/Zr ratio was high and when magnetron rf-sputtering was performed using a plasma gas Ar+5% O₂, which may be the optimum condition of rf-sputtering to form a sustainable hydrophilic layer on zirconia substrate. The wear testing using pin on disc wear apparatus was performed. The wettability and durability of Si-O coatings fabricated by magnetron radiofrequency magnetron sputtering (rf-sputtering) on zirconia substrate was studied. A plasma gas Ar+5% O₂ may be the optimum condition of rf-sputtering to form a sustainable hydrophilic layer on zirconia substrate

• Periodical: Key Engineering Materials (Volume 782)
• Pages: 189-194
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.782.189
• Online since: October 2018
• Authors: Yoshiyuki Yokogawa*, Taishi Morishima, Mitunori Uno, Masakazu Kurachi, Yutaka Doi, Harumi Kawaki, Masato Hotta
• Keywords: Durability, Reactive Plasma Sputtering, Wettability, Zirconia Substrate

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