Characterization of Excimer Laser Annealing of Arsenic Implanted Silicon

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Periodical:

Materials Science Forum (Volumes 117-118)

Edited by:

Tsunemasa Taguchi

Pages:

237-242

DOI:

10.4028/www.scientific.net/MSF.117-118.237

Citation:

T. Akane et al., "Characterization of Excimer Laser Annealing of Arsenic Implanted Silicon ", Materials Science Forum, Vols. 117-118, pp. 237-242, 1993

Online since:

January 1993

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Price:

$35.00

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