Ultrashallow Hydrogen-Like Thermal Donors in Silicon Crystals
p.219
p.219
Formation of Oxygen Clusters in Quenched Cz- and MCz-Si Crystals
p.225
p.225
Simulation of Oxygen Precipitation and Denuded Zone Formation during Thermal Anneals
p.231
p.231
Characterization of Excimer Laser Annealing of Arsenic Implanted Silicon
p.237
p.237
Heavily Arsenic Doping into Si by ArF Excimer Laser Irradiation Using Tertiarybutylarsine (tBAs)
p.243
p.243
Effective-Mass-Like Excited Pseudo-Donor States of a Complex Metastable Defect in Silicon
p.249
p.249
Zeeman Study of 735meV Photoluminescence Band in Iron-Doped Silicon
p.255
p.255
Thermal Process Dependence of Chromium Donor/Acceptor in Silicon
p.261
p.261
Co-Acceptor Complexes in Si
p.267
p.267
Heavily Arsenic Doping into Si by ArF Excimer Laser Irradiation Using Tertiarybutylarsine (tBAs)
Abstract:
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Periodical:
Materials Science Forum (Volumes 117-118)
Pages:
243-248
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Online since:
January 1993
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© 1993 Trans Tech Publications Ltd. All Rights Reserved
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