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HomeMaterials Science ForumMaterials Science Forum Vol. 203Epitaxial Growth and Processing of InP Films in a...

Epitaxial Growth and Processing of InP Films in a 'Novel' Remote Plasma-MOCVD Apparatus

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Periodical:

Materials Science Forum (Volume 203)

Pages:

85-90

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.203.85

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Online since:

February 1996

Authors:

Giovanni Bruno, Maria Losurdo, P. Capezzuto, V. Capozzi, F.G. Lorusso, A. Minafra

Keywords:

Ellipsometry, Glow-Discharge GD, Indium Phosphide, MOCVD, Photoluminescence (PL)

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© 1996 Trans Tech Publications Ltd. All Rights Reserved

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