Epitaxial Growth and Processing of InP Films in a 'Novel' Remote Plasma-MOCVD Apparatus

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Periodical:

Edited by:

A.M. Mancini, C. Paorici and M.L. Terranova

Pages:

85-90

DOI:

10.4028/www.scientific.net/MSF.203.85

Citation:

G. Bruno et al., "Epitaxial Growth and Processing of InP Films in a 'Novel' Remote Plasma-MOCVD Apparatus", Materials Science Forum, Vol. 203, pp. 85-90, 1996

Online since:

February 1996

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$35.00

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