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HomeMaterials Science ForumMaterials Science Forum Vols. 278-281High Temperature X-Ray Diffraction Studies of the...

High Temperature X-Ray Diffraction Studies of the Phase Formation Process of Iridium Silicide Thin Films

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Periodical:

Materials Science Forum (Volumes 278-281)

Pages:

448-453

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.278-281.448

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Online since:

April 1998

Authors:

R. Kurt, W. Pitschke, A. Heinrich, K. Wetzig

Keywords:

High-Temperature, Iridium Silicide Thin Films, Rietveld Method, X-Ray Diffraction (XRD)

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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