High Temperature X-Ray Diffraction Studies of the Phase Formation Process of Iridium Silicide Thin Films

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Periodical:

Materials Science Forum (Volumes 278-281)

Edited by:

R. Delhez and E.J. Mittemeijer

Pages:

448-453

DOI:

10.4028/www.scientific.net/MSF.278-281.448

Citation:

R. Kurt et al., "High Temperature X-Ray Diffraction Studies of the Phase Formation Process of Iridium Silicide Thin Films", Materials Science Forum, Vols. 278-281, pp. 448-453, 1998

Online since:

April 1998

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$35.00

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