Effects of Oxygen Stoichiometry on the Structural Properties of W-Ti-O Thin Films

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Periodical:

Materials Science Forum (Volumes 278-281)

Edited by:

R. Delhez and E.J. Mittemeijer

Pages:

472-477

DOI:

10.4028/www.scientific.net/MSF.278-281.472

Citation:

L. Sangaletti et al., "Effects of Oxygen Stoichiometry on the Structural Properties of W-Ti-O Thin Films", Materials Science Forum, Vols. 278-281, pp. 472-477, 1998

Online since:

April 1998

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$35.00

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