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HomeMaterials Science ForumMaterials Science Forum Vols. 278-281Effects of Oxygen Stoichiometry on the Structural...

Effects of Oxygen Stoichiometry on the Structural Properties of W-Ti-O Thin Films

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Periodical:

Materials Science Forum (Volumes 278-281)

Pages:

472-477

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.278-281.472

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Online since:

April 1998

Authors:

L. Sangaletti, L.E. Depero, B. Allieri, S. Groppelli, G. Sberveglieri

Keywords:

Disorder Effects, Gas Sensor, Micro Raman, Thin Film, W-Ti-O, X-Ray Diffraction (XRD)

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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