Paper Titles

High Temperature Grazing Incidence Studies on Aluminium Films
p.442

High Temperature X-Ray Diffraction Studies of the Phase Formation Process of Iridium Silicide Thin Films
p.448

Application of the Distorted-Wave Born Approximation to Interface Characterization in W/Si Multilayer Thin Films
p.454

Microstructural Characterization of Nanocrystalline Thin Films by Grazing Incidence Diffraction: Au and Tb_0.3Dy_0.7Fe₂ (Terfenol-D)
p.460

Structure of Reactively Sputtered Ta-N-O Films
p.466

Effects of Oxygen Stoichiometry on the Structural Properties of W-Ti-O Thin Films
p.472

X-Ray Diffraction Measurements on c-Axis Oriented YBaCuO Thin Films Deposited by Metalorganic Vapour Deposition
p.478

Modification of Crystllinity in Poly (Vinylalcohol) Derivatives
p.486

The Crystallinity of the Copolymers Based on Acrylic Monomers and Lignosulphonates
p.490

HomeMaterials Science ForumMaterials Science Forum Vols. 278-281Structure of Reactively Sputtered Ta-N-O Films

Structure of Reactively Sputtered Ta-N-O Films

Article Preview

Abstract:

You might also be interested in these eBooks

$European Powder Diffraction 5$ View Preview

Info:

Periodical:

Materials Science Forum (Volumes 278-281)

Pages:

466-471

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.278-281.466

Citation:

Cite this paper

Online since:

April 1998

Authors:

N. Mattern, M. Stavrev, D. Fischer

Keywords:

Ta-N-O Films, Tantalum Nitride, X-Ray Diffraction (XRD)

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1998 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: