Influence of Deposition Parameters on the Properties of Titanium Nitride Films Formed by Ion Beam Assisted Evaporation

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Periodical:

Materials Science Forum (Volumes 287-288)

Edited by:

Horst Hoffmann

Pages:

499-502

DOI:

10.4028/www.scientific.net/MSF.287-288.499

Citation:

D. Wolff and H. Oechsner, "Influence of Deposition Parameters on the Properties of Titanium Nitride Films Formed by Ion Beam Assisted Evaporation", Materials Science Forum, Vols. 287-288, pp. 499-502, 1998

Online since:

August 1998

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