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HomeMaterials Science ForumMaterials Science Forum Vols. 453-454Metal-Induced Crystallization of Polycrystalline...

Metal-Induced Crystallization of Polycrystalline Silicon by In-Situ Excimer Laser Annealing During Low-Pressure CVD Growth

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Progress in Advanced Materials and Processes

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Periodical:

Materials Science Forum (Volumes 453-454)

Pages:

43-46

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.453-454.43

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Online since:

May 2004

Authors:

S. Loreti, A. Santoni, Rudolf Fryček, I. Menicucci, C. Minarini, D. Della Sala

Keywords:

Crystallization, Laser, LPCVD, Scanning Electron Microscope (SEM), Silicon, X-Ray Diffraction (XRD)

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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