Metal-Induced Crystallization of Polycrystalline Silicon by In-Situ Excimer Laser Annealing During Low-Pressure CVD Growth

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Materials Science Forum (Volumes 453-454)

Edited by:

Dragan P. Uskokovic, Slobodan K. Milonjic, Dejan I. Rakovic

Pages:

43-46

Citation:

S. Loreti et al., "Metal-Induced Crystallization of Polycrystalline Silicon by In-Situ Excimer Laser Annealing During Low-Pressure CVD Growth ", Materials Science Forum, Vols. 453-454, pp. 43-46, 2004

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May 2004

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