Metal-Induced Crystallization of Polycrystalline Silicon by In-Situ Excimer Laser Annealing During Low-Pressure CVD Growth

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 453-454)

Edited by:

Dragan P. Uskokovic, Slobodan K. Milonjic, Dejan I. Rakovic

Pages:

43-46

DOI:

10.4028/www.scientific.net/MSF.453-454.43

Citation:

S. Loreti et al., "Metal-Induced Crystallization of Polycrystalline Silicon by In-Situ Excimer Laser Annealing During Low-Pressure CVD Growth ", Materials Science Forum, Vols. 453-454, pp. 43-46, 2004

Online since:

May 2004

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.