In this paper, the influences of depositing angles on TbFe film magnetic and magnetostrictive characteristics were discussed. TbFe films were deposited by DC magnetron sputtering. With the decrease of depositing angles from 900 to 150, TbFe film in-plane magnetization measured at 1600kA.m-1 external field is greatly increased. With the decrease of depositing angles from 900 to 150, the magnetostrictive saturation field is decreased. TbFe film in-plane magnetostriction is improved when depositing angles are changed from 900 to 150. Magnetic domain structures detected by MFM indicates that film easy magnetization direction is gradually changed from perpendicular to parallel with the decrease of depositing angles. The variation of film magnetic and magnetostrictive performances can be explained by the oblique anisotropy associated with columnar grain morphology of the films.