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Synthesis of Surface Acoustic Wave Filter with Al/ZnO Thin Film Deposited on Silicon Wafer
Abstract:
ZnO thin film, as a promising piezoelectric material, possesses unique electrical, acoustical, and optical properties. In this paper, Al/ZnO thin film was deposited on Si wafer by magnetron sputtering. Highly oriented, dense, and fine-grain polycrystalline ZnO films with excellent surface flatness and high resistivities have been obtained, when the sputtered gas pressure was 0.9 Pa, the temperature was 200 °C and the Ar-to-O2 ratio was 1:3. A 780MHz surface acoustic wave filter (SAWF) has been successfully fabricated using the Al/ZnO film on silicon wafer.
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3771-3774
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January 2005
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© 2005 Trans Tech Publications Ltd. All Rights Reserved
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