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Synthesis of Surface Acoustic Wave Filter with Al/ZnO Thin Film Deposited on Silicon Wafer
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Microstructure and Electronic Properties of Al/Zr/LiNbO₃ Multilayers
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Finite Element Analysis of Nano/Micro Pattern Fabrication by Nanoscratch Process
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The Growth of GaN Films on Si Substrates by HVPE
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Nano-Structures and Properties of Zinc Nitride Prepared by Nitridation Technique
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Laser Doping and Recrystallization for Amorphous Silicon Films by Plasma-Enhanced Chemical Vapor Deposition
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Effect of Pt Interlayer on Thermal Stability of NiSi Films
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HomeMaterials Science ForumMaterials Science Forum Vols. 475-479Finite Element Analysis of Nano/Micro Pattern...

Finite Element Analysis of Nano/Micro Pattern Fabrication by Nanoscratch Process

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Periodical:

Materials Science Forum (Volumes 475-479)

Pages:

3779-3782

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.475-479.3779

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Online since:

January 2005

Authors:

Chung Gil Kang, S.W. Youn, J.W. Lee

Keywords:

Amorphous Silicon, Elastic Recovery, Nanoscratch, Pyrex 7740 Glass, Residual Stress

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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