Annealing Effects on the Structural Properties of Gold Films on Si by the RF Magnetron Sputtering

Kyung Chul Lee; Nam Ho Kim; B.H. O; Hyoun Woo Kim

doi:10.4028/www.scientific.net/MSF.475-479.3923

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HomeMaterials Science ForumMaterials Science Forum Vols. 475-479Annealing Effects on the Structural Properties of...

Annealing Effects on the Structural Properties of Gold Films on Si by the RF Magnetron Sputtering

Abstract:

We have investigated the effect of annealing temperature on the structural property of Au thin films deposited on Si(100) substrate using the radio frequency (RF) magnetron sputtering technique. X-ray diffraction revealed that the relative intensities and FWHM of (111), (200), and (311) peaks increased and decreased, respectively, after thermal annealing at 600°C. Scanning electron microscopy indicated that after annealing at 600-700°C, Au structures agglomerated on Si(100) surfaces. Energy dispersive x-ray spectrometry (EDX) revealed that the agglomerated structure was composed of pure Au.

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Materials Science Forum (Volumes 475-479)

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3923-3926

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https://doi.org/10.4028/www.scientific.net/MSF.475-479.3923

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January 2005

Authors:

Kyung Chul Lee, Nam Ho Kim, B.H. O, Hyoun Woo Kim

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Annealing, Gold, RF Magnetron Sputtering

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