Annealing Effects on the Structural Properties of Gold Films on Si by the RF Magnetron Sputtering

Abstract:

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We have investigated the effect of annealing temperature on the structural property of Au thin films deposited on Si(100) substrate using the radio frequency (RF) magnetron sputtering technique. X-ray diffraction revealed that the relative intensities and FWHM of (111), (200), and (311) peaks increased and decreased, respectively, after thermal annealing at 600°C. Scanning electron microscopy indicated that after annealing at 600-700°C, Au structures agglomerated on Si(100) surfaces. Energy dispersive x-ray spectrometry (EDX) revealed that the agglomerated structure was composed of pure Au.

Info:

Periodical:

Materials Science Forum (Volumes 475-479)

Main Theme:

Edited by:

Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie

Pages:

3923-3926

DOI:

10.4028/www.scientific.net/MSF.475-479.3923

Citation:

K. C. Lee et al., "Annealing Effects on the Structural Properties of Gold Films on Si by the RF Magnetron Sputtering ", Materials Science Forum, Vols. 475-479, pp. 3923-3926, 2005

Online since:

January 2005

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$35.00

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