Multifunctional Thin Film Zinc Oxide Semiconductors: Application to Electronic Devices
p.3
p.3
Novel Organic Hole Transport Layers for Molecular Electronic Systems
p.8
p.8
Insights on Amorphous Silicon Nip and MIS 3D Position Sensitive Detectors
p.13
p.13
The Study of High Temperature Annealing of a-SiC:H Films
p.18
p.18
Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering
p.23
p.23
Poly-Si Thin Film Transistors: Effect of Metal Thickness on Silicon Crystallization
p.28
p.28
Organic Materials for Active Layers in Transistors: Study of the Electrical Stability Properties
p.33
p.33
Structural and Optical Characterization of Light Emitting InGaN/GaN Epitaxial Layers
p.38
p.38
Effect of Oxidant/ Monomer Ratio on the Electrical Properties of Polypyrrole in Tantalum Capacitors
p.43
p.43
Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering
Abstract:
Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X- ray diffraction and the thermal transport parameters.
Info:
Periodical:
Materials Science Forum (Volumes 514-516)
Main Theme:
Edited by:
Paula Maria Vilarinho
Pages:
23-27
DOI:
10.4028/www.scientific.net/MSF.514-516.23
Citation:
V. Thaiyalnayaki et al., "Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering", Materials Science Forum, Vols. 514-516, pp. 23-27, 2006
Online since:
May 2006
Keywords:
Price:
$35.00
Permissions: