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HomeMaterials Science ForumMaterials Science Forum Vols. 514-516Microstructure and Thermal Features of a-Si:H and...

Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering

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Abstract:

Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X- ray diffraction and the thermal transport parameters.

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Advanced Materials Forum III

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Periodical:

Materials Science Forum (Volumes 514-516)

Pages:

23-27

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.514-516.23

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Online since:

May 2006

Authors:

V. Thaiyalnayaki, M.Fátima Cerqueira, Francisco Macedo, João Alves Ferreira

Keywords:

Nanocrystalline Silicon, Structure, Thermal Property

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© 2006 Trans Tech Publications Ltd. All Rights Reserved

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