Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering
Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X- ray diffraction and the thermal transport parameters.
Paula Maria Vilarinho
V. Thaiyalnayaki et al., "Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering", Materials Science Forum, Vols. 514-516, pp. 23-27, 2006