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Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering
Abstract:
Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X- ray diffraction and the thermal transport parameters.
Info:
Periodical:
Main Theme:
Edited by:
Paula Maria Vilarinho
Pages:
23-27
Citation:
V. Thaiyalnayaki et al., "Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering", Materials Science Forum, Vols. 514-516, pp. 23-27, 2006
Online since:
May 2006
Keywords:
Price:
$38.00
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