Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering

Thaiyalnayaki, V.; Cerqueira, M.Fátima; Macedo, Francisco; Ferreira, João Alves

doi:10.4028/www.scientific.net/MSF.514-516.23

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Paper Title:

Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering

Abstract

Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X- ray diffraction and the thermal transport parameters.

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Periodical

Materials Science Forum (Volumes 514-516)

Main Theme

Advanced Materials Forum III

Edited by

Paula Maria Vilarinho

Pages

23-27

DOI

10.4028/www.scientific.net/MSF.514-516.23

Citation

V. Thaiyalnayaki, M.F. Cerqueira, F. Macedo, J. A. Ferreira, "Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering", Materials Science Forum, Vols. 514-516, pp. 23-27, 2006

Online since

May 2006

Authors

V. Thaiyalnayaki, M.Fátima Cerqueira, Francisco Macedo, João Alves Ferreira

Keywords

Nanocrystalline Silicon, Structure, Thermal Property

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$35.00

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