Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering

Abstract:

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Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X- ray diffraction and the thermal transport parameters.

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Periodical:

Materials Science Forum (Volumes 514-516)

Edited by:

Paula Maria Vilarinho

Pages:

23-27

DOI:

10.4028/www.scientific.net/MSF.514-516.23

Citation:

V. Thaiyalnayaki et al., "Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering", Materials Science Forum, Vols. 514-516, pp. 23-27, 2006

Online since:

May 2006

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$35.00

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