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The Effects of Deposition Pressure on the Optical and Structural Properties of d.c. PECVD Hydrogenated Amorphous Carbon Films

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Abstract:

A direct-current plasma enhanced chemical vapour deposition (PECVD) system was designed and built in-house for the deposition of hydrogenated amorphous carbon(a-C:H) thin films. In this work, a-C:H thin films prepared using this system at different deposition pressures were studied. The influence of deposition pressure on the deposition rate, energy gap, bonded hydrogen content and structure of the film has been investigated. The characterization techniques were determined from optical transmission spectroscopy, Fourier transform infrared spectroscopy and Xray diffraction measurements. The results demonstrated that the deposition pressure had strong influence on the deposition rate, optical energy gap and the bonded H content in the film. Evidence of crystallinity was observed in films prepared at low deposition pressure.

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Periodical:

Materials Science Forum (Volume 517)

Pages:

81-84

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.517.81

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Online since:

June 2006

Authors:

Rozidawati Awang, Boon Tong Goh, Siti Meriam Ab. Gani, Richard Ritikos, Saadah Abdul Rahman

Keywords:

Hydrogenated Amorphous Carbon, Infrared Spectroscopy, Optical Property, Plasma Deposition, Structural Property

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© 2006 Trans Tech Publications Ltd. All Rights Reserved

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