Electrodeposition of CoNiFe Alloys on n-Type Silicon

G. Fortas; S. Sam; Z. Fekih; N. Gabouze

doi:10.4028/www.scientific.net/MSF.609.207

Paper Titles

Preparation and Characterization of Microporous Membranes Prepared by Wet Phase Inversion. Application to Ni (II) Transport
p.183

Synthesis and Characterization of Cerium Oxide (CeO₂) Nanoparticles
p.189

Electrical Properties Dependent on Schottky Diode Pd/PSC-pSi(100) Based on Hydrocarbon Gas Sensor
p.195

Elaboration of Porous Silicon Multilayer Using Resistive p-Type Si
p.201

Electrodeposition of CoNiFe Alloys on n-Type Silicon
p.207

Electrical and Optical Behavior of Al₂O₃/Porous Silicon/Silicon Structures
p.213

Sol-Gel Synthesis of SiO₂-TiO₂ Film as Antireflection Coating on Silicon for Photovoltaic Application
p.221

Hydrogen Sensor: Effect of Palladium Thickness and Porous Structure of Silicon
p.225

Properties of Pt-Assisted Electroless Etched Silicon in HF/Na₂S₂O₈ Solution
p.231

HomeMaterials Science ForumMaterials Science Forum Vol. 609Electrodeposition of CoNiFe Alloys on n-Type...

Electrodeposition of CoNiFe Alloys on n-Type Silicon

Abstract:

Co, CoNi and CoFeNi layers were formed on n-type silicon by electrodeposition method from sulfate solutions. The obtained films were characterized by Cyclic Voltammetry (CV), Scanning Electron Microscopy (SEM) and Energy Dispersive Spectrometry (EDS). The results show that the morphology and the stoechiometry of CoNi and CoNiFe deposits depend on several parameters (bath composition, applied potential…). The addition of sodium acetate as complexion agent in the bath leads to the formation of highly compacted and smooth films with a good adherence to the substrate.