Ceramic Target Materials for Sputtering Applications

Abstract:

The lecture will give an overview of the manufacturing technique of ceramic target materials based on ZnO and TiO2. Sintering and plasma spraying techniques are typically used. Also special bonding procedures have to be established in order to join ceramic target materials to metallic carriers. Metallic and ceramic target materials will be compared with respect to target materials processing and sputtering experiences as well. In addition planar and cylindrical targets will be briefly discussed as sputtering of large substrates is strongly moving towards cylindrical cathode applications.

• Periodical: Materials Science Forum (Volumes 638-642)
• Pages: 805-811
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.638-642.805
• Online since: January 2010
• Authors: Christoph Simons, Albert Kastner, George Kiriakidis
• Keywords: Al Doped Zinc Oxide, Arcing, AZO, Bonding, Ceramic, CLATO, Cylindric Target, Deposition, Manufacturing, Microarcing, Rotatable, Rotative Target, Sintering, Spraying, Sputtering, Target, TiOx, Titania, Titania (TiO₂), Titanium (Ti), ZAO, Zinc, Zinc Oxide (ZnO), Zn, Zn-Al

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