Wettability and Nanotribological Response of Silicon Surfaces Functionalized by Ion Implantation

Bruno Nunes; Sergio Magalhães; Nuno Franco; Eduardo Alves; Ana Paula Serro; Rogerio Colaço

doi:10.4028/www.scientific.net/MSF.730-732.257

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HomeMaterials Science ForumMaterials Science Forum Vols. 730-732Wettability and Nanotribological Response of...

Wettability and Nanotribological Response of Silicon Surfaces Functionalized by Ion Implantation

Abstract:

Aiming to improve the nanotribological response of Si-based materials we implanted silicon wafers with different fluences of iron ions (up to 2x10¹⁷ cm^-2). Implantation was followed by annealing treatments at temperatures from 550°C to 1000°C. The implanted surfaces were analyzed by scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM) and wettability tests. Then, samples were submitted to AFM-based nanowear tests. We observe an increase of both hidrophobicity and and wear resistance of the implanted silicon, indicating that ion implantation of Si can be a route to be deeper explored in what concerns tribomechanical improvement of Si.

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Periodical:

Materials Science Forum (Volumes 730-732)

Pages:

257-262

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.730-732.257

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Online since:

November 2012

Authors:

Bruno Nunes, Sergio Magalhães, Nuno Franco, Eduardo Alves, Ana Paula Serro, Rogerio Colaço

Keywords:

Atomic Force Microscopy (AFM), Ion Implantation, Nanotribology, Silicon, Wettability

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