Thermodynamic Analysis of Chemical Vapor Deposition of the VN Coating

Xian Feng Xu; Hui Li

doi:10.4028/www.scientific.net/MSF.809-810.563

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HomeMaterials Science ForumMaterials Science Forum Vols. 809-810Thermodynamic Analysis of Chemical Vapor...

Thermodynamic Analysis of Chemical Vapor Deposition of the VN Coating

Abstract:

The VN coatings were coated by chemical vapor deposition on T12 substrate using V₂O₅, H₂ and N₂ as reactants. Thermodynamic calculation and analysis of formation reaction of VN were done by thermodynamic potential function. As shown by the experimental results, chemical vapor deposition of the VN coating with preheating temperature of 973K and deposition temperature of 1573K under normal atmospheric pressure was feasible.

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2014 China Functional Materials Technology and Industry Forum

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Periodical:

Materials Science Forum (Volumes 809-810)

Pages:

563-568

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.809-810.563

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Online since:

December 2014

Authors:

Xian Feng Xu, Hui Li*

Keywords:

Chemical Vapor Deposition (CVD), Deposition Temperature, Thermodynamic, V₂O₅, VN Coating

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References

[1] B.C. Yang and W.S. Wang: Thin Film Physics and Technology (The University of Electronic Science and Technology Press, China 1994), p.16.

Google Scholar

[2] G.Y. Meng: Chemical Vapor Deposition and New Inorganic Materials (Science Press, China 1984), p.58.

Google Scholar

[3] H.M. Guo, W.B. Shu, S.R. Qiao, S.H. Bai and G.W. Meng: Thermodynamic and Kinetic Studies on Chemical Vapor Deposition Process of TiC, (1998) No. 10, p.25.

Google Scholar

[4] C.Y. Lu, L.F. Cheng, L.T. Zhang, Y.D. Xu and C.N. Zhao: Equilibrium Prediction of the Role of Key Species in the Chemical Vapor Deposition of Silicon Carbide, Vol. 23 (2008) No. 6, p.1189.

DOI: 10.3724/sp.j.1077.2008.01189

Google Scholar

[5] F. Xu, D.W. Zuo, X.H. Zhang, H.F. Hu, C. Zhang and M. Wang: Research Progress on Cubic Boron Nitride Film for Tool Coating, Vol. 31 (2012) No. 2, p.295.

Google Scholar

[6] Y.D. Zhou: Inorganic Materials Physical Chemistry (Wuhan University of Technology Press, China 1984), p.29.

Google Scholar

[7] J.X. Zhou, H. Xu, X.G. Qi, A.L. Liu and Y.T. Xi: Thermodynamic Analysis of Chemical Vapor Deposition of the SiO2/S Composite Coatings, Vol. 44 (2008) No. 5, p.405.

Google Scholar

[8] D.H. Chen, L.X. Shi: Fluidized three-step Method Production Equipment for Flake V2O5(I), (2008) No. 3, p.23.

Google Scholar

[9] B.J. Li: Handbook of Chemistry and Chemical Technician (Dalian University of Technology Press, China 1996), p.641.

Google Scholar

[10] R.L. Ye: Inorganic Materials Physical Chemistry (China Building Industry Press, China 1986), p.39.

Google Scholar

[11] X.L. Xu: Study on Phase Formation and Reaction Kinetics of Al-B System (MS., Northeastern University, China 2010), p.21.

Google Scholar