Effect of Sputtering Power on Photocatalytic Activity of Thin TiO2 Films

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TiO2 thin films with outstanding photocatalysis can potentially be used for photocatalysis device in the field of environmental protection. TiO2 thin film (99.99%) was fabricated successfully by power metallurgy. The effect of sputtering power on TiO2 thin films by radio frequency magnetron sputtering was investigated. The results show that the higher sputtering power is beneficial for the growth of Rutile structure with superior photocatalysis. With the increasing of sputtering power, the rate of methyl orange degradation increases under UV light irradiation. The degradation rate of TiO2 thin film under sputtering power 75W and 165W is 40% and 80% respectively. This is attributed to the increase of the rutile phase with many defects and dislocation network under higher sputtering power.

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173-177

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March 2015

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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